Hexamethyldisilazide-1,3-diisopropylimidazolidine-2-ylidenegold(I) (1) is used to deposit gold microplates with (111) faces. In the absence of any secondary vapor-phase surfactant, these plates show secondary nucleation and growth of gold metal nanoparticles on the (111) faces. When tetrahydrothiophene (THT) is used as a secondary, vapor-phase surfactant, plate size increases, and secondary nucleation is controllable by temperature. Deposition of gold microplates at 370 °C using a 45 mTorr overpressure of THT shows the best experimental results, growing 20 μm2 plateaus with no apparent secondary nucleation. Computational modelling demonstrates that THT is a stronger surfactant than the carbene ligand (from the gold precursor) due to steric hindrance from the alkyl groups present in the carbene ligand.

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Keywords Chemical vapor deposition, Crystal growth, Gold, Plates, Surfactants
Persistent URL dx.doi.org/10.1002/admi.201600864
Journal Advanced Materials Interfaces
Zhang, W. (Weipeng), Dey, G. (Gangotri), Mandia, D.J. (David J.), & Barry, S.T. (2017). Using a Vapor-Phase Surfactant to Control Gold Metal Plate Growth. Advanced Materials Interfaces. doi:10.1002/admi.201600864