Low temperature plasma etching for Si3 N4 waveguide applications

2008-03-10

Journal of Vacuum Science and Technology A , Volume 26 - Issue 2 p. 253- 258

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Persistent URL	dx.doi.org/10.1116/1.2836424
Journal	Journal of Vacuum Science and Technology A
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Vandusen, R, Smy, T, Albert, J, Tarr, N.G, Waldron, P.D. (P. D.), & Celo, Dritan. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424

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