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R. Vandusen (R.), T. Smy (Tom), J. Albert (Jacques), N.G. Tarr (Gary), Waldron, P.D. (P. D.) and Celo, Dritan

2008-03-10

Low temperature plasma etching for Si3 N4 waveguide applications

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Journal of Vacuum Science and Technology A , Volume 26 - Issue 2 p. 253- 258

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Persistent URL doi.org/10.1116/1.2836424
Journal Journal of Vacuum Science and Technology A
Organisation Department of Electronics
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Vandusen, R, Smy, T, Albert, J, Tarr, N.G, Waldron, P.D. (P. D.), & Celo, Dritan. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424
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