2008-03-10
Low temperature plasma etching for Si3 N4 waveguide applications
Publication
Publication
Journal of Vacuum Science and Technology A , Volume 26 - Issue 2 p. 253- 258
Additional Metadata | |
---|---|
dx.doi.org/10.1116/1.2836424 | |
Journal of Vacuum Science and Technology A | |
Organisation | Department of Electronics |
Vandusen, R, Smy, T, Albert, J, Tarr, N.G, Waldron, P.D. (P. D.), & Celo, Dritan. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424
|