Low temperature plasma etching for Si3 N4 waveguide applications

Public Deposited
Analytics

Downloadable Content

Download PDF
Resource Type
Creator
Language
Publisher
Identifier
Citation
  • Vandusen, R, Smy, T, Albert, J, Tarr, N.G, Waldron, P.D. (P. D.), & Celo, Dritan. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424
Date Created
  • 2008-03-10

Relations

In Collection:

Items

Thumbnail Title Date Uploaded Visibility Actions
file details low-temperature-plasma.pdf 2022-08-26 Public Download