Low temperature plasma etching for Si3 N4 waveguide applications

2008-03-10

Additional Metadata
Persistent URL	doi.org/10.1116/1.2836424
Journal	Journal of Vacuum Science and Technology A
Organisation	Department of Electronics
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Vandusen, R, Smy, T, Albert, J, Tarr, N.G, Waldron, P.D. (P. D.), & Celo, Dritan. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424

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