Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching
Public Deposited- Resource Type
- Creator
- Language
- Publisher
- Identifier
- Citation
- Albert, J, Hill, K.O. (K. O.), Malo, B. (B.), Johnson, D.C. (D. C.), Bilodeau, F. (F.), Templeton, I.M. (I. M.), & Brebner, J.L. (J. L.). (1993). Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching. Applied Physics Letters, 63(17), 2309–2311. doi:10.1063/1.110509
- Date Created
- 1993-12-01
Relations
- In Collection:
Items
| Thumbnail | Title | Date Uploaded | Visibility | Actions |
|---|---|---|---|---|
|
|
maskless-writing.pdf | 2022-08-26 | Public | Download |