Additional Metadata
Persistent URL dx.doi.org/10.1063/1.110509
Journal Applied Physics Letters
Citation
Albert, J, Hill, K.O. (K. O.), Malo, B. (B.), Johnson, D.C. (D. C.), Bilodeau, F. (F.), Templeton, I.M. (I. M.), & Brebner, J.L. (J. L.). (1993). Maskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching. Applied Physics Letters, 63(17), 2309–2311. doi:10.1063/1.110509