2012-10-10
Impact of LOCOS techniques on photonic wire waveguides
Publication
Publication
Applied Optics , Volume 51 - Issue 29 p. 7089- 7093
We use the LOCal oxidation of silicon (LOCOS) method as a fabrication technique to define submicrometer photonic waveguides. We attempted fabricating the wire waveguides with two different masking processes, one with a stack of pad oxide and silicon nitride layers, and the other with a single silicon nitride layer. The smallest waveguide we achieved had a cross-section profile of 280 nm × 650 nm. The propagation loss of the waveguides was measured by the cut-back method, and the bending loss was measured by employing the serpentine pattern. The minimum propagation loss achieved was 8.78 dB /cm and the bending loss was 0.0089 dB /90° bend for a 5 μm bending radius.
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doi.org/10.1364/AO.51.007089 | |
Applied Optics | |
Organisation | Department of Electronics |
Xiong, Y. (Yule), Ibrahim, M. (Marc), & Ye, W.N. (2012). Impact of LOCOS techniques on photonic wire waveguides. Applied Optics, 51(29), 7089–7093. doi:10.1364/AO.51.007089
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