We present a dual beam multiple exposure technique that can generate complex 2-D quasi-crystal template structures. The optical system is based on the interference of two laser beams producing a family of high intensity planes. Controlled reorientation of a photosensitive sample between exposures results in an exposure dose, when developed, returns a quasi-crystal pattern. Results are shown in which quasi-crystal patterns with 8, 10, and 12-fold rotation symmetry are produced in photoresist. The results of several test runs are shown in which the quasi-crystal patterns developed in photoresist are subsequently etched into silicon. Based on an extended application of the dual beam multiple exposure optical system, a potential technique for producing 3-D quasi-crystal patterns is presented.

Additional Metadata
Persistent URL dx.doi.org/10.1364/OPEX.12.000990
Journal Optics Express
Gauthier, R, & Ivanov, A. (Alexei). (2004). Production of quasi-crystal template patterns using a dual beam multiple exposure technique. Optics Express, 12(6), 990–1003. doi:10.1364/OPEX.12.000990