A Moire technique is used in the fabrication of a diffractive phase mask by electron beam lithography. The phase mask has a varying diffraction efficiency designed to produce apodised fibre Bragg gratingswith a uniform ultraviolet beam exposure. Since the illumination is uniform, the average induced refractive index is constant along the grating and pure apodisation results.

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Persistent URL dx.doi.org/10.1049/el:19961469
Journal Electronics Letters
Albert, J, Hill, K.O., Johnson, D.C., Bilodeau, F., & Rooks, M.J. (1996). Moire phase masks for automatic pure apodisation of fibre Bragg gratings. Electronics Letters. doi:10.1049/el:19961469