Lutetium coating of nanoparticles by atomic layer deposition
Journal of Vacuum Science and Technology A , Volume 38 - Issue 2
Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.
|Journal of Vacuum Science and Technology A|
|Organisation||Department of Chemistry|
Moret, J.L.T.M. (Josette L. T. M.), Griffiths, M.B.E. (Matthew B. E.), Frijns, J.E.B.M. (Jeannine E. B. M.), Terpstra, B.E. (Baukje E.), Wolterbeek, H.T. (Hubert T.), Barry, S.T, … Van Ommen, J.R. (J. Ruud). (2020). Lutetium coating of nanoparticles by atomic layer deposition. Journal of Vacuum Science and Technology A, 38(2). doi:10.1116/1.5134446