Copper coplanar waveguides in Si substrates for 10 GHz applications

The fabrication of Copper coplanar waveguides on Silicon substrates was investigated. Plated copper metallization was found to improve the performance of coplanar waveguide transmission lines, fabricated on CMOS-compatible silicon substrate. Copper/polyimide devices increased the phase velocity of the transmission line by a factor of √2. The lower resistance of the copper and improved substrate isolation obtained with the low-k polyimide dielectric was found to enhance the performance of these lines.

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