Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from an ArF excimer laser
Optics Letters , Volume 19 - Issue 6 p. 387- 389
Photosensitivity in optical fibers and waveguides has been associated with the bleaching of an absorption band located near 5.0 eV (or 242 nm). We present new results for Bragg grating formation and UV bleaching experiments carried out using 193-nm light from an ArF excimer laser instead of the usual laser sources operating near 242 or 248 nm.
|Organisation||Department of Electronics|
Albert, J, Malo, B., Bilodeau, F., Johnson, D.C., Hill, K.O., Hibino, Y., & Kawachi, M. (1994). Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from an ArF excimer laser. Optics Letters, 19(6), 387–389. doi:10.1364/OL.19.000387