Additional Metadata
Persistent URL dx.doi.org/10.1116/1.2836424
Journal Journal of Vacuum Science and Technology A
Citation
Celo, D., Vandusen, R, Smy, T, Albert, J, Tarr, N.G, & Waldron, P.D. (2008). Low temperature plasma etching for Si3 N4 waveguide applications. Journal of Vacuum Science and Technology A, 26(2), 253–258. doi:10.1116/1.2836424