SOI waveguide fabrication process development using star coupler scattering loss measurements

Yap, K.P., Lapointe, J., Lamontagne, B., Delâge, A., Bogdanov, A., Janz, S. and B. Syrett (Barry)

2008-03-31

Presented at the Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV (December 2007)

Additional Metadata
Keywords	Fabrication process, Resist footings, Scattering loss, Sidewall roughness, Silicon-on-insulator, Star coupler
Persistent URL	dx.doi.org/10.1117/12.758968
Conference	Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Yap, K.P., Lapointe, J., Lamontagne, B., Delâge, A., Bogdanov, A., Janz, S., & Syrett, B. (2008). SOI waveguide fabrication process development using star coupler scattering loss measurements. Presented at the Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV. doi:10.1117/12.758968

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