Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor

Brazeau, A.L. (Allison L.) and S.T. Barry (Seán T.)

2008-12-09

Chemistry of Materials , Volume 20 - Issue 23 p. 7287- 7291

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Persistent URL	dx.doi.org/10.1021/cm802195b
Journal	Chemistry of Materials
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Brazeau, A.L. (Allison L.), & Barry, S.T. (2008). Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor. Chemistry of Materials, 20(23), 7287–7291. doi:10.1021/cm802195b

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