2008-12-09
Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor
Publication
Publication
Chemistry of Materials , Volume 20 - Issue 23 p. 7287- 7291
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dx.doi.org/10.1021/cm802195b | |
Chemistry of Materials | |
Organisation | Department of Chemistry |
Brazeau, A.L. (Allison L.), & Barry, S.T. (2008). Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor. Chemistry of Materials, 20(23), 7287–7291. doi:10.1021/cm802195b
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