Additional Metadata
Persistent URL dx.doi.org/10.1021/cm802195b
Journal Chemistry of Materials
Citation
Brazeau, A.L. (Allison L.), & Barry, S.T. (2008). Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor. Chemistry of Materials, 20(23), 7287–7291. doi:10.1021/cm802195b