Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor

Brazeau, A.L. (Allison L.) and S.T. Barry (Seán T.)

2008-12-09

Chemistry of Materials , Volume 20 - Issue 23 p. 7287- 7291

Additional Metadata
Persistent URL	dx.doi.org/10.1021/cm802195b
Journal	Chemistry of Materials
Organisation	Department of Chemistry
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Brazeau, A.L. (Allison L.), & Barry, S.T. (2008). Atomic layer deposition of aluminum oxide thin films from a heteroleptic, amidinate-containing precursor. Chemistry of Materials, 20(23), 7287–7291. doi:10.1021/cm802195b

Publication