Additional Metadata
Keywords atomic layer deposition precursor, chemical vapor deposition precursor, copper, gold, iminopyrrolidinates, silver, thermally robust
Persistent URL dx.doi.org/10.1021/cm402658c
Journal Chemistry of Materials
Citation
Coyle, J.P, Gordon, P.G. (Peter G.), Wells, A.P. (Adam P.), Mandia, D.J. (David J.), Sirianni, E.R. (Eric R.), Yap, G.P.A. (Glenn P. A.), & Barry, S.T. (2013). Thermally robust gold and silver iminopyrrolidinates for chemical vapor deposition of metal films. Chemistry of Materials, 25(22), 4566–4573. doi:10.1021/cm402658c