A variable diffraction efficiency phase mask is produced by focused ion beam, implanting a grating pattern into a fused SiO 2 substrate with a 100-nm-diam, 200keV Si beam. The substrate is prepared by cleaning and coating with a 20-nm-thick film of Al to dissipate the ion charge. The pattern consists of 930 lines, each 80μm long, at a pitch of 1.075μm, to obtain a 1-mm-long grating. The substrate is wet etched in a 1M% HF solution for about 45min to produce a phase mask with the desired diffraction efficiency. This phase mask is used to photoimprint Bragg gratings into standard hydrogenated single-mode telecommunication fibers using 193nm light from an ArF laser.

Additional Metadata
Persistent URL dx.doi.org/10.1116/1.588283
Journal Journal of Vacuum Science & Technology B
Citation
Erickson, L.E. (L. E.), Champion, H.G. (H. G.), Albert, J, Hill, K.O. (K. O.), Malo, B. (B.), Theriault, S. (S.), … Johnson, D.C. (D. C.). (1995). Fabrication of a variable diffraction efficiency phase mask by multiple dose ion implantation. Journal of Vacuum Science & Technology B, 13(6), 2940–2943. doi:10.1116/1.588283